发明名称 PATTERN PROJECTOR AND PATTERN INSPECTION DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To reduce the occurrence of interference fringes in a pattern projector and a pattern inspection device using laser light. <P>SOLUTION: The pattern projector and the pattern inspection device include a laser generator for generating the laser light, a mask having a pattern, an optical system provided between the laser generator and the mask for irradiating the laser light onto the mask and projecting the pattern onto an object, a rotational phase plate provided in the optical system, a driver for rotating the phase plate, and a shock-absorbing medium for preventing vibration from propagating between the phase plate and the optical system. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007294564(A) 申请公布日期 2007.11.08
申请号 JP20060118843 申请日期 2006.04.24
申请人 ADVANCED MASK INSPECTION TECHNOLOGY KK 发明人 KOGURE YOSHINAGA;KATO YOSHIKAZU
分类号 H01L21/027;G01B11/24;G03F7/20 主分类号 H01L21/027
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