| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique capable of reducing contamination in a mechanism such as a stage in an exposure device. <P>SOLUTION: A dummy substrate used for alignment process for adjusting the exposure position of a pattern image in an oil immersion-compliant exposure unit are conveyed to a substrate processing apparatus, for performing a resist coating process and a development process before and after the exposure. In the substrate processing apparatus, each surface of the dummy substrate received is inverted and then is conveyed to a back-surface cleaning processing unit to perform a back-surface cleaning process. Thereafter, each surface of the dummy substrate is again inverted and then is conveyed to a surface cleaning processing unit to perform a surface cleaning process. The dummy substrate after cleaning is again returned from the substrate processing apparatus to the exposure unit. Because, in the exposure unit, alignment process can be performed using the clean dummy substrate, the contamination can be reduced in a mechanism in the exposure unit such as a substrate stage. <P>COPYRIGHT: (C)2008,JPO&INPIT |
