OXIDE SINTERED COMPACT, TRANSPARENT OXIDE FILM, GAS BARRIER TRANSPARENT RESIN SUBSTRATE, GAS BARRIER TRANSPARENT CONDUCTIVE RESIN SUBSTRATE AND FLEXIBLE DISPLAY ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide an oxide sintered compact for a sputtering target which is film-formed at a high film forming rate and a transparent oxide film having excellent surface smoothness, low refractive index with high transparency and exhibiting high gas barrier performance.

SOLUTION: The oxide sintered compact containing tin oxide and one kind of additive element selected from a group comprising Si, Ge snd Al is used, wherein the additive element is contained in a proportion of 15-63 atom% per total content of the additive element and Sn, having a crystal phase is constituted of at least one of a metallic phase of the additive element, an oxide phase of the additive element, and a multiple oxide phase of the additive element and Sn, wherein each of the oxide phase of the additive element and the multiple oxide phase of the additive element and Sn is dispersed in a size of ≤50 μm average particle diameter.

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