| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment device capable of generating uniform plasma on a processing surface by alleviating electric field concentration right under a dielectric window. <P>SOLUTION: The plasma treatment device is equipped with a processing chamber 4 having a dielectric window 3, a microwave generation means 5, a microwave radiation means introducing microwaves generated by the microwave generation means 5 in the processing chamber 4 through the dielectric window 3, and a center electric field control means 10 structured by an antenna part 10a arranged coaxially with the microwave radiation means inside the microwave radiation means, having a cylindrical structure, with at least a face of the dielectric window 3 side opened, and with its side face made of a conductor, and an electric field control part 10b made of something other than the conductor inside the antenna part 10a. <P>COPYRIGHT: (C)2008,JPO&INPIT |
