METHOD FOR RINSING SILICON NITRIDE LAYER AFTER CLEANING

摘要

A method of rinsing a silicon nitride layer is provided to prevent defects of drop particles which are absorbed at a silicon nitride layer by applying a rinse process which cleans the silicon nitride layer by a SC-1 and then overflows pure water. A method for rinsing a silicon nitride layer comprises following steps. Wafers(63) having a exposed surface of silicon nitride layer are cleaned by using a SC-1 cleaning liquid. The cleaned wafers are dipped into a QDR(Quick Dump Rinse) bath(61), and the wafers are rinsed by supplying a rinsing solution until overflowing the bath. The silicon nitride layer is used as a hard mask when etching a gate.