发明名称 |
Exposure apparatus and device manufacturing method |
摘要 |
This invention relates to an exposure apparatus which transfers a pattern of a mask onto a wafer. The exposure apparatus includes a master stage which holds the mask, and a light source which generates light to illuminate the mask. The light source includes a solid state device which emits light by spontaneous emission. |
申请公布号 |
GB2437887(A) |
申请公布日期 |
2007.11.07 |
申请号 |
GB20070015924 |
申请日期 |
2005.06.29 |
申请人 |
AMERICAN SAFETY RAZOR COMPANY |
发明人 |
MATSURO SUGITA;TAKAO YONEHARA;TAKAAKI TERASHI;TOSHIHIKO TSUJI |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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