发明名称 |
Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same |
摘要 |
A photoresist composition, a method for forming a film pattern using the photoresist composition, and a method for manufacturing a thin film transistor array panel using the photoresist composition are provided. In one embodiment, a photoresist composition includes an alkali-soluble resin, a photosensitive compound, and an additive, for advantageously providing a uniform photoresist in a channel region.
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申请公布号 |
US7291439(B2) |
申请公布日期 |
2007.11.06 |
申请号 |
US20060483794 |
申请日期 |
2006.07.07 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PARK JEONG-MIN;LEE HI-KUK;JU JIN-HO;JEON WOO-SEOK;JUNG DOO-HEE;KIM DONG-MIN;CHOI KI-SIK |
分类号 |
G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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