PLASMA CVD APPARATUS AND METHOD FOR CLEANING A CHAMBER OF THE PLASMA CVD APPARATUS,申请号KR20000054773-传众专利搜索

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发明名称	PLASMA CVD APPARATUS AND METHOD FOR CLEANING A CHAMBER OF THE PLASMA CVD APPARATUS
摘要
申请公布号	KR100773659(B1)	申请公布日期	2007.11.05
申请号	KR20000054773	申请日期	2000.09.19
申请人		发明人
分类号	H01L21/205;H01L21/302;C23C16/44;H01L21/3065;H01L21/31;H05H1/00;H05H1/46	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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