发明名称 |
Lithographic Apparatus, Method of Exposing a Substrate, Method of Measurement, Device Manufacturing Method, and Device Manufacturing Thereby |
摘要 |
A method of exposing a substrate (e.g. in a lithographic apparatus comprising a substrate table to support a substrate) according to one embodiment of the invention includes performing first and a second height measurement of a part of at least one substrate with a first and second sensor, generating and storing an offset error map based on a difference between the measurements; generating and storing a height map of portions of the substrate (or another substrate that has had a similar processing as the part) by performing height measurements with the first sensor and correcting this height map by means of the offset error map; and exposing the substrate (or the other substrate).
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申请公布号 |
US2007252963(A1) |
申请公布日期 |
2007.11.01 |
申请号 |
US20040583985 |
申请日期 |
2004.12.22 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
MODDERMAN THEODORUS M.;VAN ASTEN NICOLAAS ANTONIUS ALLEGONDUS J.;VAN BOXMEER JOHAN M.;NIJMEIJER GERRIT J. |
分类号 |
G03B27/32;G03C5/00 |
主分类号 |
G03B27/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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