| 摘要 |
PROBLEM TO BE SOLVED: To provide a device for manufacturing a liquid crystal device, the manufacturing device capable of forming a preferable inorganic alignment layer while preventing failure in formation of an inorganic alignment layer in a desired form due to plasma. SOLUTION: The device includes a film forming chamber 2 and a sputtering device 3 that forms a film of an inorganic alignment layer of an alignment layer material on a substrate W by a sputtering method in the film forming chamber 2. The sputtering device 3 includes a pair of targets 5a, 5b opposing to each other through a plasma generating region, an opening 3a to emit sputtered particles 5p from the plasma generating region, and an electron restricting means (magnetic field generating means 16a, 16b) to trap or reflect electrons in the plasma generating region. The opening 3a is placed at a position where the sputtered particles 5p are made to be incident in an oblique direction to the substrate W. COPYRIGHT: (C)2008,JPO&INPIT
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