| 摘要 |
PROBLEM TO BE SOLVED: To provide a surface inspection device capable of performing inspection of surface flaws of high accuracy, without being affected by a white damage generating luminance of a predetermined value or higher at all times, varying the luminance or gradually becoming large in luminance. SOLUTION: Before a surface is inspected on the basis of image due to the scattered light from the surface of a wafer W photographed by a camera 5, a first camera image position, having luminance higher than a first predetermined luminance A and a second camera image position having luminance higher than a second predetermined luminance C but below the first predetermined luminance A (however, A>C) are detected from a genuine black image obtained by photographing the surface of the wafer W, in a state where light is not incident on the imaging surface of the camera 5. The detected first camera image position is decided as being a permanent flaw, and the detected second camera image position is decided as being a temporary flaw. COPYRIGHT: (C)2008,JPO&INPIT
|
