LITHOGRAPHY SIMULATION METHOD, PROGRAM AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a simulation method for performing high accuracy lithography simulation by an easy method.

SOLUTION: The method includes: a step S2 of obtaining a mask transmission function from a mask layout; a step S3 of obtaining an optical image of the mask layout by using the mask transmission function; a step S4 of applying a predetermined function filter to the mask transmission function to obtain a filtered function; and a step S5 of correcting the optical image by using the filtered function.

COPYRIGHT: (C)2008,JPO&INPIT