发明名称 EXPOSURE DEVICE AND DEVICE MANUFACTURING METHOD, AND LIQUID PROCESSOR
摘要 <P>PROBLEM TO BE SOLVED: To provide an exposure device capable of excellently irradiating a substrate with exposure light while placing a liquid in an immersed region in a desired state. <P>SOLUTION: The exposure device includes an immersion unit which forms an immersed region of liquid on a body disposed at a position which can be irradiated with the exposure light, and a first irradiation unit which irradiates the liquid with first light optically captures foreign matter in the liquid with light pressure of the first light. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007288039(A) 申请公布日期 2007.11.01
申请号 JP20060115443 申请日期 2006.04.19
申请人 NIKON CORP 发明人 OKITA SHINICHI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
代理机构 代理人
主权项
地址