MATERIAL OF THE RESIST-PROTECTING MEMBRANE FOR IMMERSION LITHOGRAPHY

摘要

The invention provides a material of the resist-protecting membrane for immersion lithography, more specifically, an alkali-soluble material of the resist-protecting membrane for immersion lithography, containing a polymer (F) which comprises repeating units (F<SUP>U</SUP>) formed by the polymerization of a polymerizable compound (f<SUP>m</SUP>) having a fluorine-containing bridged ring structure. For example, the repeating units (F<SUP>U</SUP>) are formed by the polymerization of a compound (f) selected from the group consisting of the following compounds (f1) to (f4) (wherein R<SUP>F</SUP> is H, F, C<SUB>1-3</SUB> alkyl or C<SUB>1-3</SUB> fluoroalkyl; and X<SUP>F</SUP> is F, OH, or CH<SUB>2</SUB>OH).