| 摘要 |
A fuse structure and a manufacturing method thereof are provided to protect a fuse pattern using an insulation layer when the fuse pattern is cut by a laser, thereby preventing short circuit due to debris of the fuse pattern. A dielectric structure(100) has a fuse region(A) and a wiring region(B) adjacent to the fuse region. A fuse pattern(123a) is partially formed on the fuse region. An insulation pattern(127) has a first portion(127a) positioned on the fuse region which encloses a sidewall of the fuse pattern, and a second portion(127b) positioned on the wiring region. An insulation layer(128) is formed on the insulation pattern and the fuse pattern. A first wiring pattern(103b) is formed on the wiring region, and has a sidewall enclosed by the second portion. A second wiring pattern(110b) is electrically connected to the first wiring pattern. The insulation layer is formed on exposed surfaces of the insulation pattern, the fuse pattern and the second wiring pattern. |
