| 摘要 |
PROBLEM TO BE SOLVED: To provide a means for cleaning an apparatus for a borazine compound once used for the synthesis or preservation of a borazine compound to such a high degree that the contamination, by impurities or fine particles, of a borazine compound to be synthesized or preserved next time using the apparatus is suppressed to the minimum. SOLUTION: The cleaning method of the apparatus for borazine compounds comprises a cleaning step (I) of cleaning the apparatus using an organic compound and a cleaning step (II) of cleaning the apparatus using water having an electroconductivity of 1μS/cm or less at 25°C after the cleaning step (I). COPYRIGHT: (C)2008,JPO&INPIT
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