发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD OF ADJUSTING CURRENT AMPLIFICATION FACTOR OF BIPOLAR TRANSISTOR WITH EMITTER POLYSILICON ELECTRODE STRUCTURE
摘要 PROBLEM TO BE SOLVED: To cope with both the cost reduction and the high frequency response characteristics of a longitudinal NPN bipolar transistor having a polysilicon emitter electrode structure, by controlling the current amplification factor of the transistor without adding any process. SOLUTION: On forming an emitter polysilicon 190 at low temperatures (400°C), an interfacial oxide film (natural oxide film) grows between an intrinsic base 140 and the emitter 190. Then the heat treating temperature for forming an emitter 150 is adjusted in a range of 820-910°C to control the interfacial oxide film condition and the pile up condition of electrons, thus finely adjusting the current amplification factor. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007281096(A) 申请公布日期 2007.10.25
申请号 JP20060103494 申请日期 2006.04.04
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 KOBAYASHI NOBUYOSHI
分类号 H01L21/331;H01L29/732 主分类号 H01L21/331
代理机构 代理人
主权项
地址