发明名称 DEFECT INSPECTION METHOD OF PDP SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a defect inspection method capable of precisely detecting projections on a substrate when manufacturing PDP. SOLUTION: A defect inspection device 21 comprises a stage 22 on which a substrate is placed, and a detecting device equipped with a laser radiation device 23 which radiates laser beam parallel to the upper surface of the stage 22, and a light receiving device 24 for receiving laser beam. In step 1, a PDP substrate 20 where a dielectric layer is formed on the substrate is placed on the stage 22. The laser beam is radiated from the laser radiation device 23, and at least the PDP substrate 20 or detecting device is moved so that the PDP substrate 20 passes between the laser radiation device 23 and the light receiving device 24, for receiving the laser beam with the light receiving device 24. The size of a projection is acquired based on the change in signal level when receiving the beam. In step 2, soundness is judged based on the size of the projection. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007280833(A) 申请公布日期 2007.10.25
申请号 JP20060107373 申请日期 2006.04.10
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 IKURA TSUNEO
分类号 H01J9/42;G01B11/30;G01M11/00;G01N21/88 主分类号 H01J9/42
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