| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of removing contamination of an optical element which removes contamination of an optical element in a state where the position of the optical element built in an exposure apparatus is maintained. <P>SOLUTION: A projection optical system having an optical element attached in a mirror cylinder is detached from an exposure apparatus (step S10), and contamination of the optical element in the mirror cylinder of the detached projection optical system is removed (step S11). Then, the contamination-removed projection optical system having the optical element attached in the mirror cylinder is attached on the exposure apparatus (step S12). <P>COPYRIGHT: (C)2008,JPO&INPIT |
