| 发明名称 |
CONDUCTIVE, PLASMA-RESISTANT MEMBER |
| 摘要 |
<p>A conductive and plasma-resistant member is provided to inhibit particle contamination due to plasma etching by improving plasma-resistance. A conductive and plasma-resistant member includes a sprayed film or a mixed sprayed film. The conductive and plasma-resistant member is exposed to the atmosphere of halogen based gas plasma. The sprayed film or the mixed sprayed film is a part of the conductive and plasma-resistant member which is exposed to the halogen based gas plasma. The sprayed film is made of yttrium. The mixed sprayed film is made of yttrium metal and yttrium oxide and/or yttrium fluoride.</p> |
| 申请公布号 |
KR20070104255(A) |
申请公布日期 |
2007.10.25 |
| 申请号 |
KR20070038221 |
申请日期 |
2007.04.19 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
MAEDA TAKAO;MAKINO YUUICHI;NAKANO HAJIME;UEHARA ICHIRO |
| 分类号 |
C23C4/00;C23C4/10 |
主分类号 |
C23C4/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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