发明名称 Plasma Processing System and Method of Contolling the Same
摘要 Provided is a plasma processing system comprising: a plasma reactor generating plasma by receiving an input gas; and a radio frequency generator supplying radio frequency. The radio frequency generator supplies radio frequency power for plasma generation to the plasma reactor, wherein upon power interruption within a predetermined time occurring during the operation of the plasma reactor, the radio frequency generator re-supplies the radio frequency power, without discontinuing the operation of the plasma reactor, after power returns. Thereby, the plasma reactor stably maintains plasma upon momentary power interruption.
申请公布号 US2007245962(A1) 申请公布日期 2007.10.25
申请号 US20070679790 申请日期 2007.02.27
申请人 CHOI DAE-KYU 发明人 CHOI DAE-KYU
分类号 C23C16/00 主分类号 C23C16/00
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