发明名称 METAL WIRING FORMING METHOD AND METHOD OF MANUFACTURING ACTIVE MATRIX SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To improve adhesiveness of a conductive layer for a base layer. SOLUTION: A metal wiring forming method has a step of applying a first liquid containing a base layer forming material on a substrate P, a step of thermally treating the applied first liquid to form a base layer F1, a step of applying a second liquid containing metal fine particles on the base layer F1, and a step of thermally treating the applied second liquid to form a conductive layer F2. The first liquid is thermally treated in a condition that the base layer F1 becomes an uncured state, and then, the second liquid is applied. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007280987(A) 申请公布日期 2007.10.25
申请号 JP20060101573 申请日期 2006.04.03
申请人 SEIKO EPSON CORP 发明人 NODA YOICHI
分类号 H01L21/3205;G02F1/1368;H01L21/28;H01L21/288;H01L21/768;H01L29/786 主分类号 H01L21/3205
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