发明名称 |
Pattern transfer apparatus, imprint apparatus, and pattern transfer method |
摘要 |
<p>A pattern transfer method for transferring an imprinting pattern formed on a mold provided with an alignment mark onto a substrate provided with an alignment mark or a resin material interposed between the substrate and the mold includes a first step for obtaining a first image by disposing the alignment mark provided to the mold and an alignment mark provided to a reference substrate at a first object position and observing the alignment marks through a first image pickup portion, a second step for obtaining a second image by disposing the alignment mark provided to the reference substrate at a second object position spaced apart from the first object position and observing the alignment mark through a second image pickup portion, and a third step for obtaining information about a difference in image position between the alignment marks by using the first and second images.</p> |
申请公布号 |
EP1847875(A2) |
申请公布日期 |
2007.10.24 |
申请号 |
EP20070106423 |
申请日期 |
2007.04.18 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
SUEHIRA, NOBUHITO;SEKI, JUNICHI;INA, HIDEKI;SENTOKU, KOICHI |
分类号 |
G03F7/00;G03F9/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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