发明名称 |
Photosensitive composition, photosensitive lithography plate and method for producing lithography plate |
摘要 |
Disclosed is a light sensitive composition containing a compound A having a group capable of undergoing radical polymerization, a compound B having a group capable of undergoing cationic polymerization, a photopolymerization initiator C, and a polymer binder D, the light sensitive composition being characterized in that the photopolymerization initiator C comprises an iron-arene complex and a halogenated alkyl group-containing compound.
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申请公布号 |
US7285375(B2) |
申请公布日期 |
2007.10.23 |
申请号 |
US20050558505 |
申请日期 |
2005.11.28 |
申请人 |
KONICA MINOLTA MEDICAL & GRAPHIC, INC. |
发明人 |
MATSUMURA TOSHIYUKI;MIURA NORIO |
分类号 |
G03F7/029;C08F20/28;C08G59/70;G03F7/00;G03F7/027;G03F7/028;G03F7/031;G03F7/033;G03F7/038;G03F7/14 |
主分类号 |
G03F7/029 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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