发明名称 |
Polymer spacers for creating sub-lithographic spaces |
摘要 |
A method includes forming a group of first structures on a semiconductor device and forming spacers adjacent side surfaces of each of the first structures to form a group of second structures. The method further includes using the group of second structures to form at least one sub-lithographic opening in a material layer located below the group of second structures.
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申请公布号 |
US7285499(B1) |
申请公布日期 |
2007.10.23 |
申请号 |
US20050127175 |
申请日期 |
2005.05.12 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
BELL SCOTT A.;JONES PHILLIP LAWRENCE;HUI ANGELA T. |
分类号 |
H01L21/302;H01L21/461 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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