METHOD OF DETACTING SEMICONDUCTOR DEVICE FAULTS BY USING AFM

摘要

A method for detecting a defect in a semiconductor device using an AFM is provided to allow a user to easily seize a defect position by displaying positions of a voltage value having high deviation on image information of the AFM. A voltage applied to a metal pattern formed on semiconductor substrate is measured by using a tip(200) of an AFM(Atomic Force Microscope). The measured position is detected as a defect position(310) when an average value of the measured voltage value is higher than a predetermined value. Information on the measured position is displayed in image information of the AFM as an image. The step of measuring the voltage is performed by using a voltmeter provided on each side of the tip.