发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFATURING THE SAME
摘要 The semiconductor device includes a reference voltage generator circuit and a circuit different from the reference voltage generator circuit. A semiconductor element of the reference voltage generator circuit has a channel region where a substrate impurity concentration is substantially uniform at least in the vicinity of a drain region. A semiconductor element of the circuit different from the reference voltage generator circuit has a channel region where a substrate impurity concentration is higher than in other part of the region at least in the drain region.
申请公布号 US2007243684(A1) 申请公布日期 2007.10.18
申请号 US20070767074 申请日期 2007.06.22
申请人 NEC ELECTRONICS CORPORATION 发明人 KATSUKI NOBUYUKI;OGA ATSUSHI;SENOU SHUUICHI;OTA NORIYUKI;YOSHIDA MASAHIRO;ARAI KENTA;NAKAGAWA ATSUSHI;MURAKAMI TOMOTAKA
分类号 H01L21/8234;H01L27/04;H01L21/822;H01L27/088;H01L27/148;H01L29/10;H01L29/78 主分类号 H01L21/8234
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