| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymer having a uniform composition distribution for each of polymer chains, and suitable as a resist composition, a method for producing the same, a resist composition containing the polymer and a method for producing a substrate plate formed with a pattern. <P>SOLUTION: This polymer (P) consisting of constituting units α<SB>1</SB>to α<SB>n</SB>[wherein (n) is 2 to 10 integer] is provided with that the copolymer composition distribution curve Cα<SB>i</SB>obtained by a critical adsorption chromatography method performed under the critical adsorption condition of at least one constituting unit α<SB>i</SB>[wherein, (i) is an optional integer of 1 to n] among the above constituting units α<SB>1</SB>to α<SB>n</SB>, satisfies the following formula (I): S(Tα<SB>i</SB>+15)/S(total)≤0.05. <P>COPYRIGHT: (C)2008,JPO&INPIT |
