发明名称 SEMICONDUCTOR DEVICE AND ITS FABRICATION PROCESS
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device in which only a high frequency current flowing a part of the internal line can be suppressed selectively. SOLUTION: The semiconductor device 1 comprises a semiconductor substrate 2, an insulating layer 3 formed on the semiconductor substrate 2, a magnetic body 10 buried in a partial region Rf of the insulating layer 3 to reach the surface thereof, and a metallization 5 buried in the insulating layer 3 to penetrate the magnetic body 10. The magnetic body 10 covers the entire circumference of the metallization 5 in the partial region Rf. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007273511(A) 申请公布日期 2007.10.18
申请号 JP20060093817 申请日期 2006.03.30
申请人 NEC CORP 发明人 MASUDA KOICHIRO;TSUKAGOSHI TSUNEO
分类号 H01L21/3205;H01L21/822;H01L23/52;H01L27/04 主分类号 H01L21/3205
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