| 摘要 |
A cleaner for metals is provided to remove the oxide layer and/or nitride layer deposed on a substrate without the corrosion of metals and the deformation or twisting of metals at a room temperature. A cleaner for metals comprises 0.1-5 wt% of a compound containing a fluorine atom; 0.01-2 wt% of an anticorrosive; and the balance of water. Preferably the compound containing a fluorine atom is selected from the group consisting of hydrogen fluoride, perfluoric acid, ammonium fluoride, tetramethylammonium fluoride, ammonium bifluoride, diethylene triammonium trifluoride and their mixture; and the anticorrosive is selected from the group consisting of a phosphate-based chelating agent, an anticorrosive surfactant and their mixture. |
