Stage apparatus, exposure apparatus, and device manufacturing method

摘要

A stage apparatus in which support units supporting a counter-mass surface plate on a reference surface each include a first permanent magnet disposed on one of the surface plate and the reference surface, and a pair of second permanent magnets disposed on the other of the surface plate and the reference surface so as to sandwich the first permanent. This stage apparatus is arranged to satisfy the following relations: (1) [(stroke of movement of the stage in a first direction)x(mass of moving portion of the stage in the first direction)/(mass of surface plate)]<[total sum of spaces between the first and second permanent magnets in the first direction]; and/or (2) [(stroke of movement of the stage in a second direction)x(mass of moving portion of the stage in the second direction)/(mass of surface plate)]<[total sum of the lengths in the second direction, of the second permanent magnets facing the first permanent magnet].