Multiple electron beam device

摘要

The invention provides electron multiple beam devices ( 1 ) for probing or structuring a non-transparent specimen ( 20 ) with primary electron beams ( 14 ) with an array of electron beam sources ( 3 ) to generate multiple primary electron beams ( 14 ), an electron sensor ( 12 ) with electron sensor segments ( 12 a) to detect electrons of the primary electron beams ( 14 ) and at least one anode ( 7 ) to direct the primary electron beams ( 14 ) towards the electron sensor ( 12 ). The electron sensor ( 12 ) serves to inspect the primary electron beams ( 14 ), calibrate the positions of the primary electron beams ( 14 ) and possibly adjust final focus length ( 13 ) and currents of the primary electron beams before or after a probing or structuring the upper surface ( 20 a) of a non-transparent specimens ( 20 ). Further, methods to inspect primary electron beams ( 14 ), to adjust final focus lengths ( 13 ) and to calibrate the multiple electron beam device ( 1 ) are provided.