发明名称 SUBSTRATE TREATMENT EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To reduce, as much as possible the probability of the occurrence of a curtain-like ununiformal supply of treatment liquid on a substrate surface, by supplying an amount of two steps of the treatment liquid like a curtain, and to improve the performance of replacement of the treatment liquid by increasing the amount of supply of treatment liquid. SOLUTION: A substrate equipment, which treats a substrate B transferred on a transferring path in a treatment chamber 12. includes an inlet nozzle portion 20 located above the transfer path. The inlet nozzle portion 20 has a first nozzle portion comprising first and second members 20A, 20B and a second nozzle portion comprising the second and a third members 20B, 20C together. Rinsing liquids are discharged from discharge outlets 2012a, 2022a of the first and second nozzle portions, in a direction of the width of the substrate the shape of a curtain, respectively. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007266545(A) 申请公布日期 2007.10.11
申请号 JP20060093132 申请日期 2006.03.30
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 TOMIFUJI YUKIO
分类号 H01L21/304;B08B3/02 主分类号 H01L21/304
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