POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

摘要

A positive resist composition capable of forming a high-resolution pattern reduced in LER. The positive resist composition comprises: a resin ingredient (A) which has acid-dissociable dissolution-inhibitive groups and comes to have enhanced alkali solubility by the action of an acid; and an acid generator ingredient (B) which generates an acid upon exposure to light. The positive resist composition is characterized in that the resin ingredient (A) comprises a polymer having a structural unit (a1) derived from hydroxystyrene and a structural unit (a2) derived from an acrylic ester having an acid-dissociable dissolution-inhibitive group and having a fluorine atom or lower fluoroalkyl group bonded to the alpha-position.