| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemical vapor deposition system which is high in safety without producing explosive copper acetylide and silver acetylide. SOLUTION: In the chemical vapor deposition system which forms a film of carbon, silicon carbide or the like by a chemical vapor deposition method by using a raw material containing at least carbon atom and hydrogen atom, materials such as aluminum, gold, titanium, platinum, nickel, molybdenum, tungsten and inconel are used for gas contact parts of connection parts etc. of a vacuum seal part and vacuum components without using copper, copper alloy, silver and silver alloy having dangerousness of producing explosive copper acetylide and silver acetylide. COPYRIGHT: (C)2008,JPO&INPIT
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