<p>An exposure method which can perform exposure precisely without using a large photomask. In the exposure method, exposure is performed while moving a photomask relatively above a substrate. The method comprises a mask position correcting step for recognizing the image of an existing pattern such as various wiring or black matrix formed previously on a substrate on the side for starting movement of the photomask in the moving direction and correcting the shift of the photomask from the existing pattern, and a mask position correction inspecting step for recognizing the image of a reference mark provided on the photomask and judging whether the position of the photomask is corrected exactly or not in the mask position correcting step.</p>
