| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a substrate treating apparatus capable of drying a substrate surface appropriately with a simple configuration while preventing a pattern formed on the substrate surface from collapsing when drying the substrate surface that is wet with liquid. <P>SOLUTION: An opposing surface 31 of a proximal block 3 is arranged close to a substrate surface Wf, and the proximal block 3 travels in a traveling direction (-X) while a liquid-tight layer 23 is formed at a gap space SP sandwiched between the opposing surface 31 and the substrate surface Wf. A solvent 30a is held before the proximal block 3 starts traveling on an extension surface 32 that is connected to an upstream side 33 positioned at an upstream side (+X) in a traveling direction in sides for regulating the opposing surface 31, and is inclined and extended in a direction separated from the substrate surface Wf while facing the upstream side (+X) in the traveling direction from the upstream side 33. Surface tension is decreased by the dissolution of liquid on the liquid-tight layer 23 in an evaporated solvent vapor 30b. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
