COMPOSITION FOR UNDER-RESIST FILM AND UNDER-RESIST FILM USING SAME

摘要

Disclosed is a composition for an under-resist film which enables to reduce bottom trailing of a resist pattern, while improving the shape of the resist pattern. Also disclosed is an under-resist film obtained by using such a composition. Specifically disclosed is a composition for an under-resist film containing a siloxane polymer, in which composition a certain amount of a quaternary ammonium compound is also contained.