发明名称 |
Local treatment device, lithographic apparatus and device manufacturing method |
摘要 |
A device for locally treating a substrate is disclosed. The device includes an enclosure for forming an enclosed environment at a location on the substrate, a seal for sealing the enclosed environment between the enclosure and the substrate, a supply channel for supplying a chemical reactant to the location, and a removal channel for removing a chemical from the enclosed environment.
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申请公布号 |
EP1843205(A1) |
申请公布日期 |
2007.10.10 |
申请号 |
EP20070251277 |
申请日期 |
2007.03.26 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
KRIKHAAR, JOHANNES WILHELMUS MARIA;MEESTER, ARNOUT JOHANNES;PELLENS, RUDY JAN MARIA;VAN ZEIJL, HENDRIKUS WILHELMUS |
分类号 |
G03F7/20;G03F9/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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