| 摘要 |
<p>An exposure apparatus is configured to expose a substrate (4) to light while the substrate is scanned. The apparatus comprises a stage (22) configured to hold the substrate (4) and to move, a measuring device (50) configured to measure a position of a surface of the substrate (4) held by the stage (22), a controller (110) configured to define an arrangement of measurement points with respect to each of a plurality of shot regions arranged along a straight line, and to cause the measuring device (5) to sequentially measure positions of the surface with respect to the defined measurement points in the plurality of shot regions while causing the stage (22) to move to scan the substrate (4) along the straight line. The controller (110) is configured to define the arrangement such that the plurality of shot regions have the arrangement in common with each other.</p> |
