发明名称 CONTROLLER OF SUBSTRATE PROCESSING APPARATUS, CONTROLLING METHOD OF SUBSTRATE PROCESSING APPARATUS, AND STORAGE MEDIUM STORING CONTROL PROGRAM OF SUBSTRATE PROCESSING APPARATUS
摘要 A controller of a substrate processing apparatus, a controlling method of the substrate processing apparatus, and a storage medium storing a control program thereon are provided to save resources and energy for a dummy process by omitting the dummy process when the temperature of a process chamber is properly regulated according to a product substrate. A controller of a substrate processing apparatus includes a substrate process unit, a dummy process unit(275), and a determining unit(270). The substrate process unit performs a predetermined process on a product substrate. The dummy process unit performs a dummy process on a non-product substrate. The determining unit obtains information on a temperature inside a process chamber and determines whether the temperature inside the process chamber is properly regulated based on the obtained temperature information. The substrate process unit prevents the dummy process unit from performing the dummy process on the substrate, when the temperature inside the process chamber is determined to be property regulated. At least one recipe used for processing the substrate is stored in a memory(250).
申请公布号 KR20070098685(A) 申请公布日期 2007.10.05
申请号 KR20070031063 申请日期 2007.03.29
申请人 TOKYO ELECTRON LIMITED 发明人 YOKOUCHI TAKESHI;YAGI FUMIKO
分类号 H01L21/02;H01L21/205 主分类号 H01L21/02
代理机构 代理人
主权项
地址