发明名称 |
COMPOSITION FOR FORMING ELECTRICAL INSULATION FILM, RELATED POLYMER AND METHOD FOR PRODUCING THE SAME, METHOD FOR PRODUCING ELECTRICAL INSULATION FILM, AND SILICA-BASED ELECTRICAL INSULATION FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide a composition for forming an electrical insulation film capable of forming electrical insulation film with low hygroscopicity and dielectric constant, high etching resistance and chemical liquid resistance and high mechanical strength; to provide a polymer related thereto and a method for producing the polymer; to provide a method for producing such electrical insulation film; and to provide silica-based electrical insulation film. SOLUTION: The electrical insulation film-forming composition comprises the polymer obtained by co-condensation between (A) at least one silane monomer of the general formula(1) and (B) a hydrolyzable group-containing carbosilane and an organic solvent. COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2007254596(A) |
申请公布日期 |
2007.10.04 |
申请号 |
JP20060080992 |
申请日期 |
2006.03.23 |
申请人 |
JSR CORP |
发明人 |
NAKAGAWA YASUSHI;NOBE YOHEI;HATTORI SEITARO;AKIYAMA MASAHIRO |
分类号 |
C08G77/50;H01L21/316;H01L21/768;H01L23/522 |
主分类号 |
C08G77/50 |
代理机构 |
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代理人 |
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地址 |
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