| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid etching type surface treatment device preferably removing foreign matter like precipitate attached to a treating object like a substrate. SOLUTION: This surface treatment device is provided with an etching chamber 2 etching the treating object using an etching liquid, a washing chamber 3 washing the treating object after etching; and multiple carrying rollers 4 carrying the treating object to the washing chamber 3 from the etching chamber 2. A rotary brush 5 is provided for dynamically scraping down foreign matter in the treating object, attached on the face in contact with the carrying rollers 4 in the washing chamber 3. COPYRIGHT: (C)2008,JPO&INPIT
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