发明名称 Verfahren zur Herstellung einer akustischen Oberflächenwellenanordnung
摘要 A surface acoustic wave device includes a piezoelectric substrate (1), a first surface acoustic wave element (30) having at least one interdigital transducer on the piezoelectric substrate, a second surface acoustic wave element (40) having at least one interdigital transducer which is provided on the piezoelectric substrate. The at least one interdigital transducer of the second surface acoustic wave element has a thickness that is different from the interdigital transducer of the first surface acoustic wave element, and the second surface acoustic wave element has a frequency characteristic that is different from that of the first surface acoustic wave element. An insulating film (3) is applied to the first and second surface acoustic wave elements. A thickness of the insulating film at a region on the first surface acoustic wave element is different from the thickness of a region on the second surface acoustic wave. <IMAGE>
申请公布号 DE60036050(D1) 申请公布日期 2007.10.04
申请号 DE2000636050 申请日期 2000.05.26
申请人 MURATA MANUFACTURING CO. LTD. 发明人 IKADA, KATSUHIRO;SAKAGUCHI, KENJI
分类号 H03H3/08;H03H9/145;H03H3/10;H03H9/02;H03H9/64 主分类号 H03H3/08
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