发明名称 SILVER CONDUCTIVE FILM AND METHOD OF MANUFACTURING THE SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a conductive thin film which can be largely formed in a non-vacuum atmosphere and at temperatures lower than 300°C, has a texture structure suitable as a reflective film on the side of a rear electrode of a thin-film solar cell, and has high adhesion with a substrate with a low resistance. <P>SOLUTION: A silver conductive film is a silver thin film formed on a substrate, is made up of a layer including sintered silver particles having an average grain size D<SB>TEM</SB>of 100 nm or less, has a resistivity of 5μΩcm or less, includes not more than three holes/μm<SP>2</SP>in the sintered layer, and has a texture structure with a surface roughness Ra of 10 nm to 100 nm. The silver conductive film having such a texture structure can be manufactured by a manufacturing process including a step of applying a solution of dispersed silver particles to the substrate to form a film, and then sintering the film. The solution is obtained by dispersing silver particles having an average grain size D<SB>TEM</SB>of 100 nm or less in a liquid organic medium which is nonpolar or has low polarity and boils at 60 to 300°C. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2007258677(A) 申请公布日期 2007.10.04
申请号 JP20070001310 申请日期 2007.01.09
申请人 DOWA ELECTRONICS MATERIALS CO LTD 发明人 SATO KIMITAKA;KUEDA MINORU;OKANO TAKU;OGI KOZO
分类号 H01L31/04;H01L21/28 主分类号 H01L31/04
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