| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a pattern inspection apparatus and pattern inspection method for detecting with high sensitivity line width defect that generates error of line width in pattern transferred on a wafer. <P>SOLUTION: The inspection apparatus comprises an illumination light source 11, an illumination light source system for condensing light from the illumination light source 11 and emitting it to a sample 10; a detector 18 for detecting the luminance of the light that transmits through or is reflected by the sample 10, of the light emitted from the illumination light source system to the sample 10, in order to image the sample 10; a contour pixel extraction section 233 for extracting a contour pixel, corresponding the contour of the pattern disposed in the first image for the first image, based on the luminance data output from the detector 18; and a defect detection section 238 for detecting line width defect, based on the luminance data of a plurality of contour pixels extracted by the contour pixel extraction section 233 and the luminance data of a plurality of pixels of the second image, corresponding to the plurality of contour pixels. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
