POROUS LOW DIELECTRIC CONSTANT THIN FILM AND ITS MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide the structure of a porous low dielectric constant material thin film and related manufacturing method for solving various problems associated with the conventional technology. SOLUTION: The method of manufacturing the porous low dielectric constant material thin film includes processes of: (a) preparing a substrate; (b) conducting a first chemical vapor deposition (CVD) process, and introducing a backbone precursor into a deposition chamber to form an interfacial dielectric layer on the substrate; (c) conducting a second CVD process, introducing a porogen precursor into the deposition chamber while at the same time introducing a backbone precursor, and combining the porogen precursor with the backbone precursor to form a backbone layer containing porogen on the interfacial dielectric layer; and (d) removing the porogen out of the backbone layer to form an ultralow dielectric constant material layer having a plurality of pores. The interfacial dielectric layer and the ultralow dielectric constant material layer constitute the porous low dielectric constant material thin film. COPYRIGHT: (C)2008,JPO&INPIT