发明名称 Semiconductor layer, process for forming the same, and semiconductor light emitting device
摘要 A semiconductor layer contains, as a principal constituent, a Groups III-V semiconductor compound, which may be represented by the general formula: B<SUB>x</SUB>Al<SUB>y</SUB>Ga<SUB>z</SUB>N, wherein x represents a number satisfying the condition 0<x<1, y represents a number satisfying the condition 0<=y<1, and z represents a number satisfying the condition 0<z<1, with the proviso that x+y+z=1, the semiconductor layer having been formed with a laser assisted metalorganic vapor phase epitaxy technique. A semiconductor light emitting device comprises the semiconductor layer and may be constituted as a semiconductor laser or a light emitting diode.
申请公布号 US2007228408(A1) 申请公布日期 2007.10.04
申请号 US20070730472 申请日期 2007.04.02
申请人 FUJIFILM CORPORATION 发明人 ASANO HIDEKI
分类号 H01L33/06;H01L33/16;H01L33/20;H01L33/32 主分类号 H01L33/06
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