| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a composition for forming a high refractive index film of forming a high refractive index film being suppressed in the variations of an n value and a k value on a photomask without bringing a lens into contact with an immersion medium. <P>SOLUTION: The composition for forming a high refractive index film contains a resin (A) having a polycyclic hydrocarbon ring structure and a constitutional unit (a1) in which at least one carbon atom on the hydrocarbon ring structure constitutes a main chain, and an organic solvent (S) dissolving this resin (A). Preferably, the organic solvent (S) has a cyclohexane structure. <P>COPYRIGHT: (C)2008,JPO&INPIT |
