| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a variety of reflection type photomasks the variations in focal point of which are small by reflecting light uniformly over the entire surface. <P>SOLUTION: A substrate 110, a reflective layer 120 formed on the substrate 110, a light absorbing pattern 130 formed on the reflective layer 120, and a compensation part 140a formed around the light absorbing pattern 130 are provided. Consequently, it is possible for the reflection type photomask to compensate for light reflected by the pitch of the pattern. As a result, a phenomenon in which the focal point fluctuates can be suppressed from occurring and therefore a fine pattern can be formed. <P>COPYRIGHT: (C)2008,JPO&INPIT |
